Fabrication and characterization of submicron gratings written in planar silica glass with a focused ion beam

Jacques Albert; Bernard Malo; Francois Bilodeau; Derwyn C. Johnson; Kenneth O. Hill; Ian M. Templeton; John L. Brebner

doi:10.1117/12.180949

28 July 1994 Fabrication and characterization of submicron gratings written in planar silica glass with a focused ion beam

Jacques Albert, Bernard Malo, Francois Bilodeau, Derwyn C. Johnson, Kenneth O. Hill, Ian M. Templeton, John L. Brebner

Author Affiliations +

Proceedings Volume 2213, Nanofabrication Technologies and Device Integration; (1994) https://doi.org/10.1117/12.180949
Event: Integrated Optoelectronics '94, 1994, Lindau, Germany

Abstract

Groove patterns with submicron lateral sizes and depths of several hundreds of nanometers have been defined in silica glass surfaces by focused ion beam implantation and differential wet etching in hydrofluoric acid solutions. Nonperiodic arbitrary patterns can be defined and variable depth achieved through local ion dose control. The fabrication of diffractive optical elements for excimer lasers in the ultraviolet is described.

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Jacques Albert, Bernard Malo, Francois Bilodeau, Derwyn C. Johnson, Kenneth O. Hill, Ian M. Templeton, and John L. Brebner "Fabrication and characterization of submicron gratings written in planar silica glass with a focused ion beam", Proc. SPIE 2213, Nanofabrication Technologies and Device Integration, (28 July 1994); https://doi.org/10.1117/12.180949

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