Manufacturing of half-tone phase-shift masks III: inspection, repair, and quality assurance

Toshifumi Yokoyama; Y. Suzuki; K. Hanzawa; K. Oda; Katsuhide Tsuchiya; Shigeru Noguchi; Minoru Komada; Hisashi Moro-oka

doi:10.1117/12.191938

3 November 1994 Manufacturing of half-tone phase-shift masks III: inspection, repair, and quality assurance

Toshifumi Yokoyama, Y. Suzuki, K. Hanzawa, K. Oda, Katsuhide Tsuchiya, Shigeru Noguchi, Minoru Komada, Hisashi Moro-oka

Author Affiliations +

Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191938
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan

Abstract

Half-tone phase shift masks with Cr-based shifters have been developed for i-line lithography. The printability of defects is determined with test marks for the four categories of defects: clear defects (pinholes and intrusions) and opaque defects (pinspots and extrusions) under the conditions that a normal hole of 0.40-micrometers width is formed by an i-line stepper with NA equals 0.57. The detectability with a KLA219HRL-PS and that of a KLA331 are also evaluated. The minimum detectable defect size is found to be smaller than the minimum intolerable defect size for each category. Clear defects are repairable by covering them with carbon patches deposited by a focused-ion-beam repair system. On the basis of the consideration of both the shielding effect and the halo effect of the patch, the deposition conditions are optimized: the thickness is 150 nm and the patch edge should be placed just on the hole edge. Opaque defects are repairable by removing them with a laser repair system without any printable damage. A KLA219HRL-PS is used for inspection both before repair and before shipment. It is confirmed that the well repaired (i.e., unprintable) defects are undetectable. Quality assurance tools are summarized.

Citation Download Citation

Toshifumi Yokoyama, Y. Suzuki, K. Hanzawa, K. Oda, Katsuhide Tsuchiya, Shigeru Noguchi, Minoru Komada, and Hisashi Moro-oka "Manufacturing of half-tone phase-shift masks III: inspection, repair, and quality assurance", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191938

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE