Plane multilayer amplitude gratings fabrication and measurement: recent results

Douglas P. Hansen; Hans K. Pew; David D. Allred; John R. Colton; Gary L. Stradling; John E. Gunther; Serban Porumbescu

doi:10.1117/12.193174

11 November 1994 Plane multilayer amplitude gratings fabrication and measurement: recent results

Douglas P. Hansen, Hans K. Pew, David D. Allred, John R. Colton, Gary L. Stradling, John E. Gunther, Serban Porumbescu

Proceedings Volume 2279, Advances in Multilayer and Grazing Incidence X-Ray/EUV/FUV Optics; (1994) https://doi.org/10.1117/12.193174
Event: SPIE's 1994 International Symposium on Optics, Imaging, and Instrumentation, 1994, San Diego, CA, United States

Abstract

MOXTEK and its collaborators have developed technology for the fabrication of multilayer soft x-ray diffraction gratings. The diffraction gratings we will discuss here are planar, or lamellar amplitude gratings, with a structure similar to that shown in Figure 1 . The gratings we have fabricated and measured consist of a silicon (100) wafer substrate onto which we spin photo-resist. The photo-resist is patterned holographically and the substrate is then etched using reactive plasma processing techniques. The period, or pitch of these gratings Is 0.293 jim, and the grating active area can be as large as 6 cm x 6 cm. The linespace relationship is approximately 50-50. The substrates are etched until the grooves are about 1 200 A deep. This Is done to place the bottom of the grooves deep Into the substrate where It will not be able to scatter x-ray radiation efficiently. A typical substrate is shown in Figure 2.

Citation Download Citation

Douglas P. Hansen, Hans K. Pew, David D. Allred, John R. Colton, Gary L. Stradling, John E. Gunther, and Serban Porumbescu "Plane multilayer amplitude gratings fabrication and measurement: recent results", Proc. SPIE 2279, Advances in Multilayer and Grazing Incidence X-Ray/EUV/FUV Optics, (11 November 1994); https://doi.org/10.1117/12.193174

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