Paper
3 October 1994 Effect of water on the generation of second harmonic in poled fused silica
Leanne J. Henry, Alan D. DeVilbiss, Tsung-Ein Tsai, David L. Griscom
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Abstract
The level of second harmonic generation (SHG) in fused silica can be altered by the addition and removal of water by wet and dry annealing in N2. The magnitude of the effect is sensitive to the lot of material. Maximum SHG occurs with annealing temperatures near 500 degree(s)C with smaller values of SHG occurring for annealing temperatures on either side of 500 degree(s)C. For annealed samples, the SHG has been found to have both surface and bulk components. Preliminary EPR analysis has shown a growth in both the Si and Ge E' centers on either side of a 500 degree(s)C - 600 degree(s)C annealing temperature. Finally, from depoling current data, evidence for a second order `bond effect' along with a third order `hole filling effect' has been found.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Leanne J. Henry, Alan D. DeVilbiss, Tsung-Ein Tsai, and David L. Griscom "Effect of water on the generation of second harmonic in poled fused silica", Proc. SPIE 2289, Doped Fiber Devices and Systems, (3 October 1994); https://doi.org/10.1117/12.188710
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KEYWORDS
Annealing

Second-harmonic generation

Silica

Germanium

Silicon

Electrons

Active optics

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