Paper
14 September 1994 Methodology for identification of process-induced electrically active defects
Loren C. Krott
Author Affiliations +
Abstract
One commonly used method for identification of defect contributions from different processing steps is micropartitioning. Micropartitioning allows one to evaluate the total number of defects that are added at a single process step or from a series of process steps. One can then perform a pareto analysis of the defect sources to determine the key area(s) in need of defect reduction. In general this methodology works fine, but it does not take into account whether or not the defects are electrically active. By using a similar methodology to micropartitioning, with the addition of an electrical test pattern, it is possible to identify the sources of electrically active defects. This study demonstrates a methodology for identification of the sources of electrically active defects, and compares these results to the results of micropartitioning of process modules using defect detection tools.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Loren C. Krott "Methodology for identification of process-induced electrically active defects", Proc. SPIE 2334, Microelectronics Manufacturability, Yield, and Reliability, (14 September 1994); https://doi.org/10.1117/12.186752
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Inspection

Defect detection

Semiconducting wafers

Defect inspection

Data conversion

Laser scanners

Manufacturing

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