Absorption measurement of thin films by using photothermal techniques: the influence of thermal properties

Zhouling Wu; Pao-Kuang Kuo; Robert L. Thomas; Zhengxiu Fan

doi:10.1117/12.213742

14 July 1995 Absorption measurement of thin films by using photothermal techniques: the influence of thermal properties (Abstract Only)

Zhouling Wu, Pao-Kuang Kuo, Robert L. Thomas, Zhengxiu Fan

Author Affiliations +

Proceedings Volume 2428, Laser-Induced Damage in Optical Materials: 1994; (1995) https://doi.org/10.1117/12.213742
Event: Laser-Induced Damage in Optical Materials: 1994, 1994, Boulder, CO, United States

Abstract

Photothermal techniques are widely used for measuring optical absorption of thin film coatings. In these applications the calibration of photothermal signal is typically based on the assumption that the thermal properties of the thin film make very little contribution. In this paper we take mirage technique as an example and present a detailed analysis of the influence of thin film thermal properties on absorption measurement. The results show that the traditional calibration method is not valid on surprisingly many situations. Our theoretical calculations are verified by experimental results, and the thin film coatings investigated in this work include both single and multiple layer samples. Based on the detailed studies, new calibration methods are proposed for absorption measurements by using thermal wave analysis.

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Zhouling Wu, Pao-Kuang Kuo, Robert L. Thomas, and Zhengxiu Fan "Absorption measurement of thin films by using photothermal techniques: the influence of thermal properties (Abstract Only)", Proc. SPIE 2428, Laser-Induced Damage in Optical Materials: 1994, (14 July 1995); https://doi.org/10.1117/12.213742

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