Low-voltage electron-beam lithography linked to photolithography

Lothar Bauch; Monika Boettcher; Ulrich Haak; Ulrich A. Jagdhold

doi:10.1117/12.209178

19 May 1995 Low-voltage electron-beam lithography linked to photolithography

Lothar Bauch, Monika Boettcher, Ulrich Haak, Ulrich A. Jagdhold

Proceedings Volume 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V; (1995) https://doi.org/10.1117/12.209178
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

An advanced resist process is introduced connecting the high resolution of low voltage electron beam lithography (LV-EBL) and the high productivity of photolithography using a surface imaging technique. A method to overlay these two exposures will be introduced. A pattern transfer below 100 nm is achieved.

Citation Download Citation

Lothar Bauch, Monika Boettcher, Ulrich Haak, and Ulrich A. Jagdhold "Low-voltage electron-beam lithography linked to photolithography", Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); https://doi.org/10.1117/12.209178

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