Evaluation and verification of improved edgebead removal process in CMOS production

Lorna D.H. Christensen; M. Marchione; K. Luce

doi:10.1117/12.210412

9 June 1995 Evaluation and verification of improved edgebead removal process in CMOS production

Lorna D.H. Christensen, M. Marchione, K. Luce

Proceedings Volume 2438, Advances in Resist Technology and Processing XII; (1995) https://doi.org/10.1117/12.210412
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

This paper describes an engineering approach that was taken to improve an existing edgebead removal process which used acetone exclusively. Production problems were encountered after exposure and develop of positive photoresist: after the UV bake step. These problems were manifested by popping photoresist. The approach taken here was to evaluate acetone by itself as an edgebead remover and compare it with a commercially available EBR. Specifically, a combination of ethyl lactate and 2-pentanone. The improved edgebead removal process is presented as a function of photoresist popping after the UV bake step for our CMOS process.

Citation Download Citation

Lorna D.H. Christensen, M. Marchione, and K. Luce "Evaluation and verification of improved edgebead removal process in CMOS production", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210412

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available