Mask-/reticle-making control system

Satoshi Akutagawa; Satoshi Araihara; Itaru Sakai

doi:10.1117/12.212797

3 July 1995 Mask-/reticle-making control system

Satoshi Akutagawa, Satoshi Araihara, Itaru Sakai

Proceedings Volume 2512, Photomask and X-Ray Mask Technology II; (1995) https://doi.org/10.1117/12.212797
Event: Photomask Japan 1995, 1995, Kanagawa, Japan

Abstract

The mask making is the first step in the semiconductor device manufacturing. It depends entirely upon mask delivery time whether it will take a short time or not to develop and produce the new devices. It is required to construct the system which can manage mask making and delivery quickly. It is very important to control the much various information on the many kinds of the mask for ASIC use quickly. It is also important to control the many various masks processing parameters, that is, to memorize the parameters and to use the appropriate parameters when the masks for general purpose device like a memory use are revised. The data base system to control the various information and parameters is requested from many mask makers and device ones. We have made a unitary data base including a large amount of information on the various ASIC devices and the various processing parameters of the memory devices, and information on the mask making progress, whereabouts of the masks. And we have constructed the new mask/reticle making control system using with the database.

Citation Download Citation

Satoshi Akutagawa, Satoshi Araihara, and Itaru Sakai "Mask-/reticle-making control system", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212797

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