Compensation for rapid contrast variations and correction for charging effects in scanning ion microscopy

Sam T. Davies

doi:10.1117/12.221600

25 September 1995 Compensation for rapid contrast variations and correction for charging effects in scanning ion microscopy

Sam T. Davies

Author Affiliations +

Proceedings Volume 2522, Electron-Beam Sources and Charged-Particle Optics; (1995) https://doi.org/10.1117/12.221600
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

Focused ion beam systems are now widely used tools at several stages of semiconductor device production and are finding applications in many other areas. Frequently, it is necessary to combine processing by micromachining or microdeposition with the intrinsic scanning ion microscope function of focused ion beam instruments. A problem in so doing is that image quality can change rapidly during processing as a result of changing secondary electron or secondary ion yields. Moreover, when milling insulating materials, charging effects can give rise to both spatial and temporal variations in contrast. This paper describes a method of achieving closed-loop, automated, compensation for image contrast variations which is also applicable to reducing image degradation due to charging effects in scanning ion microscopy.

Citation Download Citation

Sam T. Davies "Compensation for rapid contrast variations and correction for charging effects in scanning ion microscopy", Proc. SPIE 2522, Electron-Beam Sources and Charged-Particle Optics, (25 September 1995); https://doi.org/10.1117/12.221600

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