Paper
23 June 1995 New interferometric method for thin-film metrology
Ludmila A. Gerasimova, Alexander O. Fedorov
Author Affiliations +
Abstract
A new interferometric method for measuring thickness and refractive index of thin films on substrates without a priori information about these two parameters is presented. For measurements, the substrate is produced in the form of a wedge, with the investigated film only on a part of it. Two complex patterns of interference equal-thickness fringes are observed, produced by interference in a two-beam interferometer with the sample, and by interference of two beams reflected by the sample surfaces, each for two different wavelengths. The values of the thin film thickness and refractive index are calculated from the values of relative shifts of interference fringes between two parts of each interference pattern. The thickness of a thin film is measured with accuracy of 5 nm.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ludmila A. Gerasimova and Alexander O. Fedorov "New interferometric method for thin-film metrology", Proc. SPIE 2545, Interferometry VII: Applications, (23 June 1995); https://doi.org/10.1117/12.212653
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Cited by 1 scholarly publication.
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KEYWORDS
Thin films

Refractive index

Interferometers

Interferometry

Metrology

Beam splitters

Cameras

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