Excimer-laser-induced chemical vapor deposition of boron nitride films from borazine

M. V. Ugarov; Vladimir G. Ageev; Vitali I. Konov

doi:10.1117/12.221488

25 September 1995 Excimer-laser-induced chemical vapor deposition of boron nitride films from borazine

M. V. Ugarov, Vladimir G. Ageev, Vitali I. Konov

Proceedings Volume 2547, Laser Techniques for Surface Science II; (1995) https://doi.org/10.1117/12.221488
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

The excimer laser induced CVD of boron nitride films is reported. Basic dependencies of deposition rate on pulsed laser fluence, vapor pressure and substrate temperature are considered. Under optimum conditions h-BN film deposition rate of the order of 1 A per pulse was realized. Structure and composition of BN-films were characterized by AES and Raman spectroscopy. A simple deposition model is proposed taking into account chemisorption and partial decomposition of borazine molecules on the substrate surface between laser pulses and final decomposition of the intermediate product during the laser pulse.

Citation Download Citation

M. V. Ugarov, Vladimir G. Ageev, and Vitali I. Konov "Excimer-laser-induced chemical vapor deposition of boron nitride films from borazine", Proc. SPIE 2547, Laser Techniques for Surface Science II, (25 September 1995); https://doi.org/10.1117/12.221488

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