Paper
30 June 1995 Long-term stability of ion-sensitive field effect transistors: Si3N4, Al2O3, and Ta2O5 membranes drift
Dorota Pijanowska, Wladislaw Torbicz, M. Konwicki
Author Affiliations +
Proceedings Volume 2634, Optoelectronic and Electronic Sensors; (1995) https://doi.org/10.1117/12.213163
Event: Optoelectronic and Electronic Sensors, 1994, Warsaw-Zegrze, Poland
Abstract
Long-term stability of ion sensitive field effect transistors with inorganic membranes, dependent on the time drift phenomena is analyzed. The results presented in the paper relate to the Si3N4, Al2O3 and Ta2O5 membranes pH-ISFETs drift with the respect to the following parameters: sensitivity, linearity, linear time drift coefficient of threshold voltage and hysteresis.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dorota Pijanowska, Wladislaw Torbicz, and M. Konwicki "Long-term stability of ion-sensitive field effect transistors: Si3N4, Al2O3, and Ta2O5 membranes drift", Proc. SPIE 2634, Optoelectronic and Electronic Sensors, (30 June 1995); https://doi.org/10.1117/12.213163
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KEYWORDS
Field effect transistors

Electrodes

Cadmium

Dielectrics

Low pressure chemical vapor deposition

Aluminum

Ions

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