Paper
1 May 1996 Multiple wavelength vertical-cavity laser arrays with wide wavelength span and high uniformity
Wupen Yuen, Gabriel S. Li, AiKaterina Ioakeimidi, Constance J. Chang-Hasnain
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Abstract
Multiple-wavelength vertical-cavity surface-emitting laser arrays are fabricated by using a patterned-substrate growth technique and a location-resolvable in situ optical calibration method in a molecular beam epitaxy system. We achieved a record wavelength span of 62.7 nm, highly uniform threshold currents with an average of 2.16 +/- 0.81 mA, and high repeatability of wavelength spacing between 15 arrays with sharp wavelength shift rate of 117.14 nm/mm. Accuracy of 0.28% of high and low wavelength limits and a 2.66 angstroms wavelength standard deviation from 4 X 35 arrays are also obtained.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wupen Yuen, Gabriel S. Li, AiKaterina Ioakeimidi, and Constance J. Chang-Hasnain "Multiple wavelength vertical-cavity laser arrays with wide wavelength span and high uniformity", Proc. SPIE 2690, Wavelength Division Multiplexing Components, (1 May 1996); https://doi.org/10.1117/12.238928
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KEYWORDS
Vertical cavity surface emitting lasers

Gallium arsenide

Semiconducting wafers

Fabry–Perot interferometers

Gallium

Quantum wells

Temperature metrology

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