Paper
8 April 1996 Proposed high-power UV industrial demonstration laser at CEBAF
Stephen V. Benson, Joseph J. Bisognano, Courtlandt L. Bohn, Larry Cardman, William B. Colson, Paul C. Davidson, David Douglas, H. Frederick Dylla, David Engwall, Jock Fugitt, John C. Goldstein, Kevin Jordan, David Kehne, Zhenghai Li, Hong-Xiu Liu, Lia Merminga, George R. Neil, David Neuffer, Michelle D. Shinn, Mark Wiseman, Robert K. Wong
Author Affiliations +
Abstract
The Laser Processing Consortium, a collaboration of industries, universities, and the Continuous Electron Accelerator Facility in Newport News, Virginia, has proposed building a demonstration industrial processing laser for surface treatment and micro-machining The laser is a free-electron laser with average power output exceeding 1 kW in the ultraviolet. The design calls for a novel driver accelerator that recovers most of the energy of the exhaust electron beam to produce laser light with good wall-lug efficiency. The laser and accelerator design use technologies that are scalable to much higher power. We will describe the critical design issues in the laser such as the stability, power handling, and losses of the optical resonator, and the quality, power, and reliability of the electron beam. We will also describe the calculated laser performance. Finally progress to date on accelerator development and resonator modeling will be reported.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephen V. Benson, Joseph J. Bisognano, Courtlandt L. Bohn, Larry Cardman, William B. Colson, Paul C. Davidson, David Douglas, H. Frederick Dylla, David Engwall, Jock Fugitt, John C. Goldstein, Kevin Jordan, David Kehne, Zhenghai Li, Hong-Xiu Liu, Lia Merminga, George R. Neil, David Neuffer, Michelle D. Shinn, Mark Wiseman, and Robert K. Wong "Proposed high-power UV industrial demonstration laser at CEBAF", Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); https://doi.org/10.1117/12.237714
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KEYWORDS
Ultraviolet radiation

Electron beams

Free electron lasers

Mirrors

Laser processing

Resonators

Control systems

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