More stable algorithm for rigorous coupled wave analysis applied to topography simulation in optical lithography and its numerical implementation

Seung-Gol Lee; Kyung-Il Lee; Jong-Ung Lee; Yongkyoo Choi; Hong-Seok Kim

doi:10.1117/12.240966

7 June 1996 More stable algorithm for rigorous coupled wave analysis applied to topography simulation in optical lithography and its numerical implementation

Seung-Gol Lee, Kyung-Il Lee, Jong-Ung Lee, Yongkyoo Choi, Hong-Seok Kim

Author Affiliations +

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240966
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

This paper discusses a more stable algorithm of rigorous coupled wave analysis applicable to 2-D exposure simulation in an optical lithography. This algorithm can resolve a divergence problem inherently and can easily be implemented as a full vector model. 2-D exposure simulator based on this algorithm is developed and applied successfully to a very thick photoresist system. Intensity distributions inside the photoresist are simulated and compared with those of other vector models. The adaptive layering technique is introduced to the simulation of bleaching process in order to reduce the computation time. It is found that the technique can greatly reduce memeory size and computation time with reasonable accuracy.

Citation Download Citation

Seung-Gol Lee, Kyung-Il Lee, Jong-Ung Lee, Yongkyoo Choi, and Hong-Seok Kim "More stable algorithm for rigorous coupled wave analysis applied to topography simulation in optical lithography and its numerical implementation", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240966

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