Optimization of stepper parameters and their influence on OPC

Rakesh R. Vallishayee; Steven A. Orszag; Eytan Barouch

doi:10.1117/12.240931

7 June 1996 Optimization of stepper parameters and their influence on OPC

Rakesh R. Vallishayee, Steven A. Orszag, Eytan Barouch

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240931
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

An algorithm for the optimization of stepper parameters has been designed and implemented. The cost function used in this optimization is the contrast. The aerial image is computed using the computer code FAIM. First, the contrast of the image is calculated and the derivatives of the contrast with respect to the stepper parameters are evaluated. The computational cost of these calculations is only slightly more than that of one aerial image simulation. A conjugate gradient type algorithm is then used to obtain the minimum of the contrast.

Citation Download Citation

Rakesh R. Vallishayee, Steven A. Orszag, and Eytan Barouch "Optimization of stepper parameters and their influence on OPC", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240931

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