Diffraction grating formation on porous silicon using a CO2 laser

A. U. Dar'jushkin; V. A. Karavanskii; S. B. Korovin; Vladimir I. Pustovoy; K. Timoshechkin

doi:10.1117/12.232226

11 March 1996 Diffraction grating formation on porous silicon using a CO₂ laser

A. U. Dar'jushkin, V. A. Karavanskii, S. B. Korovin, Vladimir I. Pustovoy, K. Timoshechkin

Proceedings Volume 2777, ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics; (1996) https://doi.org/10.1117/12.232226
Event: ALT '95 International Conference: Advanced Materials for Optics and Optoelectronics, 1995, Prague, Czech Republic

Abstract

Large interest to porous silicon (PS) has arisen since the discovery of its intensive luminescence in the visible range under ultraviolet radiation or charge injection excitation. A lot of experimental and theoretical works have been devoted to the investigation of PS microstructure, its electrical, electro-optical, linear and non-linear-optical properties. This research was stimulated by the prospects of creation of integrated electro-optical devices on a silicon base. Formation of diffractional grating on the porous silicon layer may be interesting for the planar technology optoelectronic devices on the porous silicon. This work is also interesting from the point of view of powerful pulse radiation interaction with PS and influence on its optical and structural properties.

Citation Download Citation

A. U. Dar'jushkin, V. A. Karavanskii, S. B. Korovin, Vladimir I. Pustovoy, and K. Timoshechkin "Diffraction grating formation on porous silicon using a CO₂ laser", Proc. SPIE 2777, ALT'95 International Symposium on Advanced Materials for Optics and Optoelectronics, (11 March 1996); https://doi.org/10.1117/12.232226

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