Pulsed laser deposition in a chemically reactive environment: application to the synthesis and deposition of high quality thin films

I. N. Mihailescu

doi:10.1117/12.2298950

1 September 1996 Pulsed laser deposition in a chemically reactive environment: application to the synthesis and deposition of high quality thin films

I. N. Mihailescu

Author Affiliations +

Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 27781W (1996) https://doi.org/10.1117/12.2298950
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of

Abstract

From more than a decade now, the lasers have been applied to the synthesis and/ or the deposition of performnat thin films. The thin films are usually grown by laser chemical vapour deposition (LCVD). This method, however, suffers from the necessity of high-temperature substrate heating and usually resorts to dangerous gaseous precursors.

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I. N. Mihailescu "Pulsed laser deposition in a chemically reactive environment: application to the synthesis and deposition of high quality thin films", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 27781W (1 September 1996); https://doi.org/10.1117/12.2298950

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