Improvement of pattern position accuracy with the LMS2020

Takehiko Okada; H. Yamazaki; Yoji Tono-oka; Haruo Kinoshita

doi:10.1117/12.245229

24 July 1996 Improvement of pattern position accuracy with the LMS2020

Takehiko Okada, H. Yamazaki, Yoji Tono-oka, Haruo Kinoshita

Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245229
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan

Abstract

A high pattern position accuracy of ±50nm or less is required for ULSI devices such as 64Mb and 256MbDRAMs. To achieve this high pattern position accuracy, it is necessary to use high performance lithography tools. And to make good use of their performance, it is important to monitor the performance of them using a metrology tool with high accuracy, analyze their respective position error factors, and then do feedback corrections exactly. The Leitz LMS2020 was introduced to meet the requirements of pattern position accuracy for 0.25 μm rule devices. By monitoring the performance of MEBES4000 with LMS2020, and maintaining its error at a minimum, a high pattern position accuracy of ±50nm or less could be achieved.

Citation Download Citation

Takehiko Okada, H. Yamazaki, Yoji Tono-oka, and Haruo Kinoshita "Improvement of pattern position accuracy with the LMS2020", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245229

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