Paper
12 September 1996 Advanced software system for yield improvement on manufacturing fab
Miguel Recio, Almudena Fernandez, Victorino Martin Santamaria, Maria J. Peman, Gerardo Gonzalez, J. R. Hoyer, Steve Whitlock, David James, Mark Hausen
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Abstract
How can we optimize the data collection and data processing to provide us with the most significant information to drive the yield enhancement in a fast and efficient way? With the aim of facing this question this paper describes a software- system which is a part of the global yield enhancement strategy at our factory. The software developed correlates data gathered both in-line and at the end of the fabrication process. The description of the system is accompanied with descriptions of historical cases trying to show the capabilities of the type of correlation. The paper also discusses the natural expansion of the software-system to convert it into a more 'knowledge-based' tool.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Miguel Recio, Almudena Fernandez, Victorino Martin Santamaria, Maria J. Peman, Gerardo Gonzalez, J. R. Hoyer, Steve Whitlock, David James, and Mark Hausen "Advanced software system for yield improvement on manufacturing fab", Proc. SPIE 2874, Microelectronic Manufacturing Yield, Reliability, and Failure Analysis II, (12 September 1996); https://doi.org/10.1117/12.250830
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Cited by 2 scholarly publications.
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KEYWORDS
Semiconducting wafers

Manufacturing

Data processing

Particles

Software development

Raster graphics

Yield improvement

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