Processing applications with the 157-nm fluorine excimer laser

Peter R. Herman; Keith R. Beckley; Brian C. Jackson; Kou Kurosawa; David Moore; Takayuki Yamanishi; Jianhao Yang

doi:10.1117/12.270086

31 March 1997 Processing applications with the 157-nm fluorine excimer laser

Peter R. Herman, Keith R. Beckley, Brian C. Jackson, Kou Kurosawa, David Moore, Takayuki Yamanishi, Jianhao Yang

Proceedings Volume 2992, Excimer Lasers, Optics, and Applications; (1997) https://doi.org/10.1117/12.270086
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

Excimer-laser processing techniques can be extended to a broader and more diverse range of materials by moving to vacuum-ultraviolet laser source such as the molecular fluorine laser. The 157-nm output wavelength takes advantage of the high opacity in most materials and a short pulse duration to minimize thermal loading of target surfaces. The laser readily drives photochemical interactions and affords patterning of approximately 0.1-micrometers features. In this paper, we summarize the recent progress in our laboratory on applying these principles to the development of F₂ laser applications. Examples include micromachining of high- bandgap optical materials, fabricating rib waveguides, growing debris-free silica films, driving photosensitivity responses in optical fibers, photochemical processing of III-V semiconductors, and writing fine-feature holographic structures.

Citation Download Citation

Peter R. Herman, Keith R. Beckley, Brian C. Jackson, Kou Kurosawa, David Moore, Takayuki Yamanishi, and Jianhao Yang "Processing applications with the 157-nm fluorine excimer laser", Proc. SPIE 2992, Excimer Lasers, Optics, and Applications, (31 March 1997); https://doi.org/10.1117/12.270086

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