Erbium-doped glass-ridge waveguides fabricated with a collimated magnetron sputter deposition process

Cheng-Chung Li; Hong Koo Kim; Michele Migliuolo

doi:10.1117/12.264241

22 January 1997 Erbium-doped glass-ridge waveguides fabricated with a collimated magnetron sputter deposition process

Cheng-Chung Li, Hong Koo Kim, Michele Migliuolo

Proceedings Volume 3006, Optoelectronic Integrated Circuits; (1997) https://doi.org/10.1117/12.264241
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

We report a new fabrication process for Er-doped glass ridge waveguides. The process does not require etching of an Er- doped film in defining the lateral dimension of a waveguide, but involves a lift-off process using polyimide as a sacrificial layer. An Er-doped soda-lime silicate glass film (1.5 micrometer thick) was deposited at 350 degrees Celsius using a collimated sputtering technique. Conventional sputtering techniques have been known to be incompatible with a lift-off process. The collimated sputtering, however, allowed us easy lift-off of Er-doped films, and produced well-defined ridges with smooth surface profiles as confirmed by scanning electron microscope analysis. Guided mode profiles were measured at 1.3 micrometer wavelength and compared with the simulation results.

Citation Download Citation

Cheng-Chung Li, Hong Koo Kim, and Michele Migliuolo "Erbium-doped glass-ridge waveguides fabricated with a collimated magnetron sputter deposition process", Proc. SPIE 3006, Optoelectronic Integrated Circuits, (22 January 1997); https://doi.org/10.1117/12.264241

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