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7 July 1997 Compaction of fused silica under low-fluence/long-term 193-nm irradiation
Charlene M. Smith, Nicholas F. Borrelli, Douglas C. Allan, Thomas P. Seward
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Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.275970
Event: Microlithography '97, 1997, Santa Clara, CA, United States
Abstract
The compaction (densification) of fused silica under low fluence (< 1 mJ/cm2/pulse), long term (hundreds of millions of pulses) 193 nm irradiation has been studied. With the use of a finite element analysis, the unconstrained densification, (delta) (rho) /(rho) , is extracted from the experimentally determined wavefront distortion. We find that the densification of silica in the low fluence exposure regime corresponds to what is predicted from the behavior described by: (delta) (rho) /(rho) equals 0.000117 (NI2)0.53 where N equals number of pulses, I equals intensity (mJ/cm2/pulse). Results are presented of high and low intensity studies that establish the utility of the above form as a predictive tool for densification in fused silica.
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Charlene M. Smith, Nicholas F. Borrelli, Douglas C. Allan, and Thomas P. Seward "Compaction of fused silica under low-fluence/long-term 193-nm irradiation", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.275970
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KEYWORDS
Silica
Finite element methods
Wavefront distortions
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