Half-micron excimer laser lithography using a 1:1 broadband catadioptric lens with a half-circle field

Dunwu Lu; Huijie Huang; Yu Yan; Longlong Du; Ruichang Gao

doi:10.1117/12.276055

7 July 1997 Half-micron excimer laser lithography using a 1:1 broadband catadioptric lens with a half-circle field

Dunwu Lu, Huijie Huang, Yu Yan, Longlong Du, Ruichang Gao

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276055
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

We have designed and constructed an excimer laser lithography system at 248.3 nm. The system consists of a KrF excimer laser illuminator and a 1:1 broadband catadioptric projection lens with a half circle image field. Resolutions of 0.6 micrometers L/S and 0.5 micrometers L/S are obtained in AZ1350J resist and PMMA resist respectively.

Citation Download Citation

Dunwu Lu, Huijie Huang, Yu Yan, Longlong Du, and Ruichang Gao "Half-micron excimer laser lithography using a 1:1 broadband catadioptric lens with a half-circle field", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276055

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