Performance of 1 kHz KrF excimer laser for DUV lithography

Palash P. Das; Richard G. Morton; Igor V. Fomenkov; William N. Partlo; Richard L. Sandstrom; Cynthia A. Maley; Ray Cybulski

doi:10.1117/12.270109

4 April 1997 Performance of 1-kHz KrF excimer laser for DUV lithography

Palash P. Das, Richard G. Morton, Igor V. Fomenkov, William N. Partlo, Richard L. Sandstrom, Cynthia A. Maley, Ray Cybulski

Author Affiliations +

Proceedings Volume 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference; (1997) https://doi.org/10.1117/12.270109
Event: XI International Symposium on Gas Flow and Chemical Lasers and High Power Laser Conference, 1996, Edinburgh, United Kingdom

Abstract

In response to the requirement for higher wafer throughput and increased dosage accuracy in DUV lithography steppers and scanners, Cymer has developed a 1 kHz KrF laser optimized for this application. We shall describe its performance and design features.

Citation Download Citation

Palash P. Das, Richard G. Morton, Igor V. Fomenkov, William N. Partlo, Richard L. Sandstrom, Cynthia A. Maley, and Ray Cybulski "Performance of 1-kHz KrF excimer laser for DUV lithography", Proc. SPIE 3092, XI International Symposium on Gas Flow and Chemical Lasers and High-Power Laser Conference, (4 April 1997); https://doi.org/10.1117/12.270109

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