Automated OPC for application in advanced lithography

Kurt G. Ronse; Alexander V. Tritchkov; John Randall; Rik M. Jonckheere; Kouros Ghandehari; Luc Van den Hove

doi:10.1117/12.277300

28 July 1997 Automated OPC for application in advanced lithography

Kurt G. Ronse, Alexander V. Tritchkov, John Randall, Rik M. Jonckheere, Kouros Ghandehari, Luc Van den Hove

Proceedings Volume 3096, Photomask and X-Ray Mask Technology IV; (1997) https://doi.org/10.1117/12.277300
Event: Photomask Japan '97, 1997, Kawasaki City, Japan

Abstract

Optical lithography is still the preferred technology for semiconductor volume production. The wavelength reduction cannot keep up with the pace of decreasing feature sizes. As a result, printing occurs closer and closer to the resolution limit of the projection tools, inducing severe proximity effects. In this paper, an overview of three automated optical proximity correction packages is given. Correction accuracy as well as mask making feasibility are touched upon. An attempt is made to predict the need for OPC in the optical lithography roadmap. It is expected that OPC will be needed to push the 248 nm lithography down to 0.18 micrometer, while it can then further be used to push 193 nm lithography down to 0.13 micrometer.

Citation Download Citation

Kurt G. Ronse, Alexander V. Tritchkov, John Randall, Rik M. Jonckheere, Kouros Ghandehari, and Luc Van den Hove "Automated OPC for application in advanced lithography", Proc. SPIE 3096, Photomask and X-Ray Mask Technology IV, (28 July 1997); https://doi.org/10.1117/12.277300

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