The response of photographic film to X-rays from laser- plasma is of practical interest. Film is often used for the ultimate detection of x-rays in crystal and grating spectrometers and in imaging instruments such as pinhole cameras largely because of its high spatial resolution (approximately 1 - 10 microns). Characteristic curves for wavelengths--3 nm and 23 nm are presented for eight x-ray films (Kodak 101-01, 101-07, 104-02, Kodak Industrex CX, Russian UF-SH4, UF-VR2, Ilford Q plates and Shanghai 5F film). The calibrations were obtained from the emission of laser-produced carbon plasmas and a Ne-like Ge X-ray laser.
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