Paper
14 October 1997 X-ray micromachining of deep 3D terahertz waveguide components using a laser plasma source at 1-nm wavelength
I. C. Edmond Turcu, Chris M. Mann, Sung W. Moon, B. J. Maddison, Ric M. Allott, Nicola Lisi, Syed Ejazu Huq, Nam Seong Kim
Author Affiliations +
Abstract
Fabrication of 3D terahertz waveguide components is demonstrated using a novel x-ray micromachining process with integral and embedded x-ray masks. 1 nm x-rays generated by a laser-plasma source are used to expose chemically amplified resist. A repeated exposure and development technique shortens the total x-ray exposure time to 10 min to obtain the required 48 micrometers high structures. A 2.5 THz waveguide cavity is fabricated in gold by electroplating the above resist microstructure.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
I. C. Edmond Turcu, Chris M. Mann, Sung W. Moon, B. J. Maddison, Ric M. Allott, Nicola Lisi, Syed Ejazu Huq, and Nam Seong Kim "X-ray micromachining of deep 3D terahertz waveguide components using a laser plasma source at 1-nm wavelength", Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); https://doi.org/10.1117/12.284000
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Cited by 1 scholarly publication.
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KEYWORDS
X-rays

Waveguides

Photomasks

Gold

Plasma

X-ray lithography

X-ray sources

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