Paper
13 June 1997 InAsSb heterojunction photodiodes grown by liquid phase epitaxy
Jaroslaw Rutkowski, Jolanta Raczynska, Antoni Rogalski, Krzysztof Adamiec, Waldemar Larkowski
Author Affiliations +
Proceedings Volume 3179, Solid State Crystals in Optoelectronics and Semiconductor Technology; (1997) https://doi.org/10.1117/12.276232
Event: XII Conference on Solid State Crystals: Materials Science and Applications, 1996, Zakopane, Poland
Abstract
In this paper, the growth of p-n InAsSb/InSb heterojunction using liquid phase epitaxy (LPE) has been discussed. The layers have been grown on B InSb substrate using an In-rich solution in horizontal slider type boat. The active InAsSb layer was first grown with a desired composition. The carrier concentrations in the top layer in the range 1016 cm-3 to 1020 cm-3 was easily controlled using Cd doping. The standard structure consisted of 100 micrometers heavily doped n-type InSb substrate, an 10 micrometers InAsSb active region, and 2 micrometers heavily doped InSb p-type cap layer. Mirror like surface morphology was observed using a Nomarski differential interference contrast microscope. The structural characterization and the composition of InAsSb have been determined from x-ray diffraction data and IR transmission characteristic. The technology and construction of mesa photodiodes, both backside and frontside illuminated, have been presented. The analyses of the R0A product and current-voltage characteristics as a function of temperature shows that the dark currents of InSb/InSb photodiodes are diffusion limited. At higher As composition the R0A product is affected by the generation-recombination current of the depletion region.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jaroslaw Rutkowski, Jolanta Raczynska, Antoni Rogalski, Krzysztof Adamiec, and Waldemar Larkowski "InAsSb heterojunction photodiodes grown by liquid phase epitaxy", Proc. SPIE 3179, Solid State Crystals in Optoelectronics and Semiconductor Technology, (13 June 1997); https://doi.org/10.1117/12.276232
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KEYWORDS
Photodiodes

Liquid phase epitaxy

Supercooling

Heterojunctions

Infrared radiation

Diodes

Doping

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