Paper
14 August 1997 Preliminary results on x-ray lithography using a compact plasma focus
Sing Lee, X. Feng, Guan Zhang, Paul Choon Keat Lee, Mahe Liu, Adrian Serban, Stuart Victor Springham, Terence Kin Shun Wong, K. Wira, C. Selvam, A. Thang
Author Affiliations +
Proceedings Volume 3183, Microlithographic Techniques in IC Fabrication; (1997) https://doi.org/10.1117/12.280532
Event: ISMA '97 International Symposium on Microelectronics and Assembly, 1997, Singapore, Singapore
Abstract
A 1.8kJ compact plasma focus source operated in neon is demonstrated as an x-ray source for microlithography in the wavelength range of 0.8-1.4 nm. Lithographs are obtained by exposing the resist to the x-ray point source with a mask in contact with the resist. The total energy emitted is measured using PIN diodes and photoconducting diamond detectors to be 15J per shot with a spectrum peaked at 1keV corresponding to the K shell lines from the neon working gas. The maximum repetition rate of 20 Hz allows lithographs to be obtained in less than 20 seconds when a reasonably sensitive resist is used.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sing Lee, X. Feng, Guan Zhang, Paul Choon Keat Lee, Mahe Liu, Adrian Serban, Stuart Victor Springham, Terence Kin Shun Wong, K. Wira, C. Selvam, and A. Thang "Preliminary results on x-ray lithography using a compact plasma focus", Proc. SPIE 3183, Microlithographic Techniques in IC Fabrication, (14 August 1997); https://doi.org/10.1117/12.280532
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Cited by 7 scholarly publications.
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KEYWORDS
Plasma

X-ray lithography

Neon

X-ray sources

Diamond

Optical lithography

Photomasks

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