Compact solid state UV laser for photochemistry and materials processing

Andrew H. Kung; Poe-Jou Chen; Lee Jr-i; Jaya Sharma; Hai-Lung Dai

doi:10.1117/12.307140

30 April 1998 Compact solid state UV laser for photochemistry and materials processing

Andrew H. Kung, Poe-Jou Chen, Lee Jr-i, Jaya Sharma, Hai-Lung Dai

Proceedings Volume 3272, Laser Techniques for Surface Science III; (1998) https://doi.org/10.1117/12.307140
Event: Optoelectronics and High-Power Lasers and Applications, 1998, San Jose, CA, United States

Abstract

We describe the design and performance of an all solid state uv laser source that produces several hundred milliwatts at 266 nm and up to one hundred milliwatts at 213 nm. Examples of using this source to ablate borosilicate glass and to expose (beta) -chloroethyl silsequioxane on silicon are discussed.

Citation Download Citation

Andrew H. Kung, Poe-Jou Chen, Lee Jr-i, Jaya Sharma, and Hai-Lung Dai "Compact solid state UV laser for photochemistry and materials processing", Proc. SPIE 3272, Laser Techniques for Surface Science III, (30 April 1998); https://doi.org/10.1117/12.307140

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