Paper
7 April 1998 1.3-μm InAsP/InAlGaAs MQW lasers for high-temperature operation
Takayoshi Anan, Mitsuki Yamada, Keiichi Tokutome, Shigeo Sugou
Author Affiliations +
Abstract
High quality strained InAsP was grown using gas-source molecular-beam-epitaxy (GSMBE) and the band structure was determined. The conduction band discontinuity ratio of InAsP/InP heterostructure was about 0.35, contrary to the reported value of 0.75. We proposed a new InAsP/InAlGaAs material system with type-I superlattice suitable for a high performance LD for 1.3-micrometer optical subscriber systems. The crystal quality was improved by introducing an InP spacer layer and the RTA process. High characteristic temperature of 143 K was achieved with this material system.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takayoshi Anan, Mitsuki Yamada, Keiichi Tokutome, and Shigeo Sugou "1.3-μm InAsP/InAlGaAs MQW lasers for high-temperature operation", Proc. SPIE 3284, In-Plane Semiconductor Lasers: from Ultraviolet to Mid-Infrared II, (7 April 1998); https://doi.org/10.1117/12.304441
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Cited by 1 scholarly publication.
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KEYWORDS
Quantum wells

Aluminum

Arsenic

Pulsed laser operation

Absorption

Crystals

Heterojunctions

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