Application of scanning thermal microscopy to the study of thermophysical properties of ultrathin photoresist films

Fernando A. Escobedo; David S. Fryer; Juan J. de Pablo

doi:10.1117/12.308791

8 June 1998 Application of scanning thermal microscopy to the study of thermophysical properties of ultrathin photoresist films

Fernando A. Escobedo, David S. Fryer, Juan J. de Pablo

Author Affiliations +

Proceedings Volume 3332, Metrology, Inspection, and Process Control for Microlithography XII; (1998) https://doi.org/10.1117/12.308791
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Monte-Carlo simulation methods are used to investigate the glass transition temperature measurements from a scanning thermal microscopy study of thin photoresist films. We find that, consistent with our own experimental observations, film thickness has a profound effect on the glass transition temperature. Depending on whether the film is confined or not, we observe an increase or a decrease of the glass transition temperature. These findings are explained in terms of structural changes occurring at the molecular level.

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Fernando A. Escobedo, David S. Fryer, and Juan J. de Pablo "Application of scanning thermal microscopy to the study of thermophysical properties of ultrathin photoresist films", Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); https://doi.org/10.1117/12.308791

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