Advanced negative resists using novel aminoplast crosslinkers

Ali Afzali-Kushaa; Jeffrey D. Gelorme; Laura L. Kosbar; Mark O. Neisser; W. Brunswold; Christopher Feild; Margaret C. Lawson; Pushkara Rao Varanasi

doi:10.1117/12.312358

29 June 1998 Advanced negative resists using novel aminoplast crosslinkers

Ali Afzali-Kushaa, Jeffrey D. Gelorme, Laura L. Kosbar, Mark O. Neisser, W. Brunswold, Christopher Feild, Margaret C. Lawson, Pushkara Rao Varanasi

Author Affiliations +

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312358
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Current negative tone resists based on poly(4- hydroxystyrene) and aminoplast crosslinkers suffer from the limited solubility of commercially available crosslinkers in the most common casting solvents. The aminoplast crosslinkers also increase the dissolution rate of the base resin in aqueous alkaline developer. The lithographic performance of these resists is often limited by microbridging at high resolution. In this paper, synthesis of a series of glycoluril based aminoplast crosslinkers is described and the lithographic performance of resist formulations incorporating such compounds is discussed.

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Ali Afzali-Kushaa, Jeffrey D. Gelorme, Laura L. Kosbar, Mark O. Neisser, W. Brunswold, Christopher Feild, Margaret C. Lawson, and Pushkara Rao Varanasi "Advanced negative resists using novel aminoplast crosslinkers", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312358

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