Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks

Mark L. Raphaelian; J. David Casey Jr.; Andrew F. Doyle; David C. Ferranti; John C. Morgan

doi:10.1117/12.328841

1 September 1998 Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks

Mark L. Raphaelian, J. David Casey Jr., Andrew F. Doyle, David C. Ferranti, John C. Morgan

Author Affiliations +

Proceedings Volume 3412, Photomask and X-Ray Mask Technology V; (1998) https://doi.org/10.1117/12.328841
Event: Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V, 1998, Kawasaki City, Japan

Abstract

Over the past several years, advanced photolithography has moved from 0.35 micrometers technology to 0.25 micrometers as the standard. Soon the technology will move into the 0.18 micrometers generation. Due to the ever-shrinking feature sizes on advanced photolithographic masks, phase shifting technology has been incorporated to improve resolution on the exposed wafer. On such masks the minimum phase error and the maximum percent transmission must be dealt with. These requirements have challenged the ability to repair masks with opaque and clear defects. The Micrion focused ion beam system currently repairs opaque defects found on advanced phase shifting chrome and molybdenum silicide masks. In this paper, Micrion discusses advanced repair techniques and strategies used to address the stringent requirements of matching phase and percent transmission at the repaired defect sites. Difficulties in opaque defect and clear defect repair strategies will be discussed.

Citation Download Citation

Mark L. Raphaelian, J. David Casey Jr., Andrew F. Doyle, David C. Ferranti, and John C. Morgan "Current focused-ion-beam repair strategies for opaque defects and clear defects on advanced phase-shifting masks", Proc. SPIE 3412, Photomask and X-Ray Mask Technology V, (1 September 1998); https://doi.org/10.1117/12.328841

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available