Roughness evaluation from ultrapure fluid transfer surface materials for microelectronics fabrication

Dumitru Gh. Ulieru

doi:10.1117/12.328460

30 October 1998 Roughness evaluation from ultrapure fluid transfer surface materials for microelectronics fabrication

Dumitru Gh. Ulieru

Proceedings Volume 3426, Scattering and Surface Roughness II; (1998) https://doi.org/10.1117/12.328460
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

The microelectronics fab need the manufacturing in ultraclean environments. The actual and future requirements of new generation of semiconductor devices become more stringent that which demand the reduction of tolerances to particles in cleanroom air and in processing liquids, gases and vacuum. The purity of process chemicals, water and gases is one area under scruting the systems for distribution. These fluids must also be examined so that their contamination charge to be minimal. For examining functional surfaces of fluid distribution systems by using more surface analysis tools such as electron spectroscopy for chemical analysis (ESCA), auger electron spectroscopy for chemical analysis (AES), scanning electron spectroscopy (SEM), brush analyzer or 3D laser scanner provide specification of a material identity, a measure of its surface contaminant, and a measurement record of surface roughness. In our paper we will analyze two case studies of investigation results of surface roughness measurement for electropolished 316L stainless steel and molded polyvinylidene fluoride (PVDF).

Citation Download Citation

Dumitru Gh. Ulieru "Roughness evaluation from ultrapure fluid transfer surface materials for microelectronics fabrication", Proc. SPIE 3426, Scattering and Surface Roughness II, (30 October 1998); https://doi.org/10.1117/12.328460

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