Influence of ion implantation on the reflectance spectrum of HgCdTe

Xiangyang Li; JianHua Zhao; Wenjuan Zhu; Runqing Jiang; Yueyuan Xia; Xiaoning Hu; Jun Zhao; Huiqin Lu; Xinwen Hu; Jiaxiong Fang

doi:10.1117/12.331317

18 November 1998 Influence of ion implantation on the reflectance spectrum of HgCdTe

Xiangyang Li, JianHua Zhao, Wenjuan Zhu, Runqing Jiang, Yueyuan Xia, Xiaoning Hu, Jun Zhao, Huiqin Lu, Xinwen Hu, Jiaxiong Fang

Author Affiliations +

Proceedings Volume 3437, Infrared Spaceborne Remote Sensing VI; (1998) https://doi.org/10.1117/12.331317
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1998, San Diego, CA, United States

Abstract

An obvious minimum was observed in the reflectance spectrum of ion implanted Hg_1-xCd_xTe. The anodic oxidation method and beveling technique were used to learn the spectrum changing with the depth. This minimum even can be observed when a layer with thickness thicker than the ion range was removed from the implanted surface. Considering the high electron concentration of the implanted layer, this phenomenon was explained by using the model of reflection of layered media in which the refractive index changes with the depth. By numerical fitting, the depth profile of the carrier density and refractive the index of the ion implanted layer were obtained.

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Xiangyang Li, JianHua Zhao, Wenjuan Zhu, Runqing Jiang, Yueyuan Xia, Xiaoning Hu, Jun Zhao, Huiqin Lu, Xinwen Hu, and Jiaxiong Fang "Influence of ion implantation on the reflectance spectrum of HgCdTe", Proc. SPIE 3437, Infrared Spaceborne Remote Sensing VI, (18 November 1998); https://doi.org/10.1117/12.331317

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