Paper
13 October 1998 Enhancing throughput over 100 times by a triple-tapered structure for a near-field optical fiber probe
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Abstract
We have successfully fabricated an extremely high throughput probe for near-field optics introducing a triple-tapered structure to reduce the loss in a tapered core, to focus the light, and to excite effectively the HE11 mode. A focused ion beam and selective chemical etching were used for fabrication. Over 100 times increase in the throughput of the triple-tapered probe with the aperture diameter D < 100 nm was realized in comparison with the conventional single-tapered probe. Furthermore, due to the third taper with a small cone angle, the localized optical near-field on the triple-tapered probe with D equals 60 nm has been confirmed.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takashi Yatsui, Motonobu Kourogi, Kazuo Tsutsui, and Motoichi Ohtsu "Enhancing throughput over 100 times by a triple-tapered structure for a near-field optical fiber probe", Proc. SPIE 3467, Far- and Near-Field Optics: Physics and Information Processing, (13 October 1998); https://doi.org/10.1117/12.326807
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Cited by 1 scholarly publication.
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KEYWORDS
Near field optics

Wet etching

Near field

Optical fibers

Cladding

Ion beams

Metals

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