High-sensitivity thermoluminescence applied to environmental monitoring

K. J. Velbeck; L. Zhang; Joe E. Rotunda; Marko Moscovitch

doi:10.1117/12.339036

10 February 1999 High-sensitivity thermoluminescence applied to environmental monitoring

K. J. Velbeck, L. Zhang, Joe E. Rotunda, Marko Moscovitch

Proceedings Volume 3534, Environmental Monitoring and Remediation Technologies; (1999) https://doi.org/10.1117/12.339036
Event: Photonics East (ISAM, VVDC, IEMB), 1998, Boston, MA, United States

Abstract

We describe the development of a new environmental TLD Dosemeter Badge and dose computation algorithm based on the new LiF:Mg,Cu,P material. LiF:Mg,Cu,P, with its high sensitivity, tissue equivalence, energy independence, and low fading characteristics, is a natural choice for environmental dosimetry. The badge consists of a card and a plastic holder. The card contains four LiF:Mg,Cu,P elements, each 3.2 mm square and 0.4 mm thick, encapsulated in Teflon^R. The badge is symmetrical and uses four filters to discriminate low and high energy photons and to determine Directional Dose Equivalent, H'(0.07,(alpha) ), and Ambient Dose Equivalent, H*(10). Extensive data was taken based on irradiations of 920 dosemeters to both single and mixed fields of photons and betas. In addition, angular incidence data of various fields was taken. The approach to the algorithm is empirical and is based on this data. While most algorithms are based solely on perpendicular incidence exposure, this algorithm is being developed to account for the angular response of the dosemeter. This paper will present the algorithm for perpendicular irradiation; the angular response portion is in development. The dosemeter is designed to meet the criteria of the new draft standard ANSI N13.29, 'Environmental Dosimetry Performance -- Criteria for Testing.'

Citation Download Citation

K. J. Velbeck, L. Zhang, Joe E. Rotunda, and Marko Moscovitch "High-sensitivity thermoluminescence applied to environmental monitoring", Proc. SPIE 3534, Environmental Monitoring and Remediation Technologies, (10 February 1999); https://doi.org/10.1117/12.339036

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