InGaN/GaN MQW SCH lasers grown on SiC

Gary E. Bulman; Kathy Doverspike; Kevin W. Haberern; Heidi Dieringer; Hua-Shuang Kong; John A. Edmond; Y. K. Song; M. Kuball; Arto V. Nurmikko

doi:10.1117/12.344527

1 April 1999 InGaN/GaN MQW SCH lasers grown on SiC

Gary E. Bulman, Kathy Doverspike, Kevin W. Haberern, Heidi Dieringer, Hua-Shuang Kong, John A. Edmond, Y. K. Song, M. Kuball, Arto V. Nurmikko

Author Affiliations +

Proceedings Volume 3628, In-Plane Semiconductor Lasers III; (1999) https://doi.org/10.1117/12.344527
Event: Optoelectronics '99 - Integrated Optoelectronic Devices, 1999, San Jose, CA, United States

Abstract

Laser diode structures were fabricated by metal-organic chemical vapor deposition (MOCVD) from the AlN-InN-GaN system on single crystal 6H-SiC substrates. An AlGaN conducting buffer layer was developed for these devices, which provides a vertical conduction path between SiC substrate and the active device region. Violet and blue multiple quantum well (MQW) separate confinement heterojunction (SCH) LDs were fabricated having InGaN wells and GaN barriers. The lowest pulsed operation room temperature threshold current density obtained for lasing was 7.1 kA/cm² in a 4-well structure. Lasing has also been obtained in these same devices at duty cycles up to 75%.

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Gary E. Bulman, Kathy Doverspike, Kevin W. Haberern, Heidi Dieringer, Hua-Shuang Kong, John A. Edmond, Y. K. Song, M. Kuball, and Arto V. Nurmikko "InGaN/GaN MQW SCH lasers grown on SiC", Proc. SPIE 3628, In-Plane Semiconductor Lasers III, (1 April 1999); https://doi.org/10.1117/12.344527

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