Investigation of lithography performance using multipass gray (MPG) with MEBES 5000

Robert L. Dean; David W. Alexander; Jan M. Chabala; Thomas P. Coleman; Caryn Hartglass; Maiying Lu; Charles A. Sauer; Suzanne Weaver

doi:10.1117/12.346222

23 April 1999 Investigation of lithography performance using multipass gray (MPG) with MEBES 5000

Robert L. Dean, David W. Alexander, Jan M. Chabala, Thomas P. Coleman, Caryn Hartglass, Maiying Lu, Charles A. Sauer, Suzanne Weaver

Author Affiliations +

Proceedings Volume 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98; (1999) https://doi.org/10.1117/12.346222
Event: 15th European Conference on Mask Technology for Integrated Circuits and Micro-Components, 1998, Munich, Germany

Abstract

Leading edge technologies require continually shrinking design grids due to the demands of decreasing minimum feature size and higher resolution. Using conventional raster-scanned exposure tools to place these patterns on photomasks result in longer write times, because linear decreases in address result in exponential increases in write time. This phenomenon can be compensated for by changes in writing strategies. Multipass gray is one method of drastically improving throughput at small addresses while retaining lithographic quality.

Citation Download Citation

Robert L. Dean, David W. Alexander, Jan M. Chabala, Thomas P. Coleman, Caryn Hartglass, Maiying Lu, Charles A. Sauer, and Suzanne Weaver "Investigation of lithography performance using multipass gray (MPG) with MEBES 5000", Proc. SPIE 3665, 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98, (23 April 1999); https://doi.org/10.1117/12.346222

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