Alternate novolak resin fractionation

Michelle M. Cook; M. Dalil Rahman; Stan F. Wanat; Douglas S. McKenzie; Balaji Narasimhan; Robert K. Fea; Melodie I. Munoz

doi:10.1117/12.350168

11 June 1999 Alternate novolak resin fractionation

Michelle M. Cook, M. Dalil Rahman, Stan F. Wanat, Douglas S. McKenzie, Balaji Narasimhan, Robert K. Fea, Melodie I. Munoz

Author Affiliations +

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350168
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Novolak resins fractionated using a unique method, were compared to resins fractionated with conventional methods. The potential for improving the fractionation/separation process and for making improved or more consistent resist with the resins was identified. Several experimental designs were run to determine optimum conditions needed to achieve better separation. Isolated resins were used to make experimental i-line photoresists which were tested against resists made with the conventional processes.

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Michelle M. Cook, M. Dalil Rahman, Stan F. Wanat, Douglas S. McKenzie, Balaji Narasimhan, Robert K. Fea, and Melodie I. Munoz "Alternate novolak resin fractionation", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350168

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