Chemically amplified resist based on the methacrylate polymer with 2-trimethylsilyl-2-propyl ester protecting group

Jin-Baek Kim; Hyun-Woo Kim; Si-Hyeung Lee; Sang-Jun Choi; Joo-Tae Moon

doi:10.1117/12.350224

11 June 1999 Chemically amplified resist based on the methacrylate polymer with 2-trimethylsilyl-2-propyl ester protecting group

Jin-Baek Kim, Hyun-Woo Kim, Si-Hyeung Lee, Sang-Jun Choi, Joo-Tae Moon

Author Affiliations +

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350224
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

Poly(2-trimethylsilyl-2-propyl methacrylate-co-(gamma) - butyrolactone-2-yl methacrylate) was synthesized and evaluated as a potential dry-developable chemically amplified photoresist. When the counterion of the photogenerated acid does not provide a fluoride ion, e.g., sulfonate, the carbonium ion undergoes elimination to produce 2,2,3-trimethyl-2-silabut-3-ene, and regenerates another acid. The deprotection of 2-trimethylsilyl-2-propyl group of the polymer takes place in the exposed region after post-exposure bake. The difference of silicon content between the unexposed and exposed regions is large enough to form patterns using oxygen reactive-ion etching. Poly(2- trimethylsilyl-2-propyl methacrylate-co-(gamma) - butyrolactone-2-yl methacrylate) was evaluated as a resists for ArF excimer laser lithography. 0.24 micrometers line/space patterns were obtained using the conventional developer with an ArF excimer laser stepper. 1 micrometers line/spacer patterns were obtained using dry development process with O₂ reactive ion etching.

Citation Download Citation

Jin-Baek Kim, Hyun-Woo Kim, Si-Hyeung Lee, Sang-Jun Choi, and Joo-Tae Moon "Chemically amplified resist based on the methacrylate polymer with 2-trimethylsilyl-2-propyl ester protecting group", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350224

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE