Contrast enhancement by alkali decomposable additives in chemically amplified negative i-line resists

Yasunori Uetani; Hiroshi Moriuma; Yuko Hirai; Yoshiyuki Takata; Airi Yamada

doi:10.1117/12.350232

11 June 1999 Contrast enhancement by alkali decomposable additives in chemically amplified negative i-line resists

Yasunori Uetani, Hiroshi Moriuma, Yuko Hirai, Yoshiyuki Takata, Airi Yamada

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350232
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

We reported the novel alkali decomposable additives improve dissolution contrast in quinonediazide type positive resists. We have found that NHSE also improves dissolution contrast in chemically amplified negative resists. Good profiles and resolution are obtained by adding NHSE in the chemically amplified negative i-line resist system.

Citation Download Citation

Yasunori Uetani, Hiroshi Moriuma, Yuko Hirai, Yoshiyuki Takata, and Airi Yamada "Contrast enhancement by alkali decomposable additives in chemically amplified negative i-line resists", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350232

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