Planarizing AR for DUV lithography

Timothy G. Adams; Suzanne Coley; Manuel doCanto; Dana Gronbeck; Matthew King; Edward K. Pavelchek

doi:10.1117/12.350273

11 June 1999 Planarizing AR for DUV lithography

Timothy G. Adams, Suzanne Coley, Manuel doCanto, Dana Gronbeck, Matthew King, Edward K. Pavelchek

Proceedings Volume 3678, Advances in Resist Technology and Processing XVI; (1999) https://doi.org/10.1117/12.350273
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

A systematic approach was taken in order to improve the planarity of a DUV anti reflectant (AR) utilized for various lithographic steps, particularly those involving a patterned transparent layer. These layers can occur in both front and back end processing. Two approaches were pursued to accomplish this. The first approach was to minimize the molecular weight of the AR polymer. Polymers with weight average molecular weights from 45,000 daltons to as low as 2,300 daltons were evaluated. The planarity of the AR improved significantly for polymers with Mw's below 20,000 daltons. The second approach was to add plasticizers in order to reduce the glass transition temperature of the precrosslinked film. The addition of plasticizers to the AR was effective in increasing the planarity. One of the plasticizers contained a DUV chromophore used to maintain the required optical density of the AR. It was proven possible to make these changes while maintaining lithographic performance in both resist profiles and reflection control.

Citation Download Citation

Timothy G. Adams, Suzanne Coley, Manuel doCanto, Dana Gronbeck, Matthew King, and Edward K. Pavelchek "Planarizing AR for DUV lithography", Proc. SPIE 3678, Advances in Resist Technology and Processing XVI, (11 June 1999); https://doi.org/10.1117/12.350273

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