Billion-level durable ArF excimer laser with highly stable energy

Osamu Wakabayashi; Tatsuo Enami; Takeshi Ohta; Hirokazu Tanaka; Hirokazu Kubo; Toru Suzuki; Katsutomo Terashima; Akira Sumitani; Hakaru Mizoguchi

doi:10.1117/12.354311

26 July 1999 Billion-level durable ArF excimer laser with highly stable energy

Osamu Wakabayashi, Tatsuo Enami, Takeshi Ohta, Hirokazu Tanaka, Hirokazu Kubo, Toru Suzuki, Katsutomo Terashima, Akira Sumitani, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354311
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

We have succeeded in the development of the ArF excimer laser with high performance and durability, by researching and developing of the spectral measurement and gas control technologies, laser chamber with radio frequency preionizer, the high repetition rate solid state pulse power module and the optimized highly durable optical module. As regards spectral measurement technologies, the true instrumental function of a monitor etalon have been measured by our developed 193nm coherent light source. Spectrum of ArF laser could be obtained precisely by deconvolution performed using the covolved spectrum of the ArF laser and the measured instrumental function of the monitor etalon. As for gas control technologies, the influence of impurities given to the ArF laser performance was bigger about 5-20 times compared with the KrF one. And we have paid attention that low concentration Xe gas has effect to the triple output energy. The durability test of 2 billion pulses has been done for the first time in the world. The developed ArF laser kept the integrated energy stability less than +/- 0.6 percent and spectral band-width of FWHM less than 0.8 pm. The result showed, developed laser has an enough performance for lithography even after the pulse number exceeds 2 billion pulses.

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Osamu Wakabayashi, Tatsuo Enami, Takeshi Ohta, Hirokazu Tanaka, Hirokazu Kubo, Toru Suzuki, Katsutomo Terashima, Akira Sumitani, and Hakaru Mizoguchi "Billion-level durable ArF excimer laser with highly stable energy", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354311

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