Paper
26 July 1999 Impact of pellicle damage on patterning characteristics in ArF lithography
Junji Miyazaki, Masaya Uematsu, Tohru Ogawa
Author Affiliations +
Abstract
Pellicle durability and the effect of damaged pellicles on lithographic performance were investigated. It was found that pellicles lose their thickness but do not change their optical constant in an air atmosphere when irradiated by an ArF laser. Changes in pellicle thickness cause a wave aberration change. It was confirmed that this damage affects lithographic performance in simulations and experiments. It was estimated that transmittance of a 1 percent change causes a CD shift of 0.6 nm. We have also found that a lifetime of latest pellicle is over one year. Pellicles are now available with enough durability, as the pellicle durability has been greatly improved.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Junji Miyazaki, Masaya Uematsu, and Tohru Ogawa "Impact of pellicle damage on patterning characteristics in ArF lithography", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354364
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KEYWORDS
Pellicles

Lithography

Transmittance

Reticles

Laser irradiation

Photomasks

Refractive index

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