Boron phosphide films on new substrate materials

Ewan M. Waddell; Caspar C. Clark

doi:10.1117/12.354618

26 July 1999 Boron phosphide films on new substrate materials

Ewan M. Waddell, Caspar C. Clark

Proceedings Volume 3705, Window and Dome Technologies and Materials VI; (1999) https://doi.org/10.1117/12.354618
Event: AeroSense '99, 1999, Orlando, FL, United States

Abstract

Boron phosphide (BP) films deposited by plasma assisted chemical vapor deposition are known to be very effective in protecting substrate materials from solid and liquid particle erosion encountered in high speed flight. This paper describes the result obtained by protecting the 3-5 micrometers band substrate material silicon and the soft 8-11.5 micrometers band substrate materials zinc selenide. In addition results are presented to show that germanium can be very effectively protected from the corrosive effects of salt water and salt fog.

Citation Download Citation

Ewan M. Waddell and Caspar C. Clark "Boron phosphide films on new substrate materials", Proc. SPIE 3705, Window and Dome Technologies and Materials VI, (26 July 1999); https://doi.org/10.1117/12.354618

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