Paper
8 April 1999 Beryllium doping in Al0.5Ga0.5As MBE layers
Jan Szatkowski, Ewa Placzek-Popko, K. Sieranski, Ole Per Hansen
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Abstract
P-type ternary semiconducting compound AlGaAs has been used as an active element in many semiconducting devices since the application of the molecular beam epitaxy (MBE) technique to grow the material. Beryllium is usually used as an effective mass acceptor dopant in the MBE grown AlGaAs. However there were some reports on possible Be related deep centers especially in higher aluminum contents. In present paper we report on deep levels found with the help of DLTS method in Be doped p type MBE grown Al0.5Ga0.5As. The aim of our studies presented in this paper was an attempt to find relationship between amount of incorporated Be and properties of deep levels observed in the material. For this purpose two types of samples with different Be concentrations (2 X 1017 cm-3 and 1 X 1016 cm-3). In both types of samples seven hole traps, labelled by us H0-H6, were detected by DLTS measurements. For H1-H4 traps the heights of corresponding DLTS signal peak decrease with decreasing Be amount what means that their concentrations follow the concentration of incorporated Be. Therefore these traps may be related to Be. The trap H5 may be oxygen-related.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan Szatkowski, Ewa Placzek-Popko, K. Sieranski, and Ole Per Hansen "Beryllium doping in Al0.5Ga0.5As MBE layers", Proc. SPIE 3725, International Conference on Solid State Crystals '98: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology, (8 April 1999); https://doi.org/10.1117/12.344710
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KEYWORDS
Beryllium

Gallium arsenide

Aluminum

Capacitance

Semiconductors

Temperature metrology

Doping

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